2019 Summer School – Characterization of Materials.2019 Advanced Course: Instrumented Nanoindentation.2019 CCMX – NCCR MARVEL Materials Science Day.Tech Apero – Smart Fibers for Wearable Sensors and Drug Delivery.2019 Advanced Course: Introduction to scanning electron microscopy microanalysis techniques.2020 Winter School “Nanoparticles: from fundamentals to applications in life sciences”.2020 Inorganic Particle Synthesis by Precipitation: From Nanoparticles to Self-organised Mesocrystals and from Theory to Practice.2020 CCMX – ScopeM Advanced Course: Advanced Characterization of Materials at the Micro-, Nano- and Atomic Scale.2021 CCMX Advanced Course: Powder Characterisation and Dispersion – from nanometers to millimeters and from theory to practice.2021 CCMX Characterization of Materials Summer School.2021 Summer School: Tribology and Surfaces Interactions.2021 Advanced Course: Advanced X-Ray Diffraction Methods for Coatings: Strain, Defects and Deformation Analysis of Thin Films.2021 Advanced Course: Introduction to scanning electron microscopy microanalysis techniques.EPFL – AMI course: Nanoparticles, from fundamentals to applications.2022 CCMX Advanced Course: Instrumented Nanoindentation.2022 CCMX – ScopeM Course: Advanced Characterization of Materials at the Micro-, Nano and Atomic Scale.2023 Thin film and small scale mechanics.EDU version for EPFL units on distrilogīy Dassault Systems, mechanical drawing softwareīy Ulf Griesmann, Matlab/Octave GDS import/modify moduleīy Lucas Heitzmann, Python GDS import/modify moduleĬMi user library available for download (gds ziped):.Packages: free (limited), reduced (~EUR300), full (~EUR1100)īy Peardrop Design Systems, layout editor.Installed on cmipc27 and cmipc58 in CMi open office BM 1.132.Softwareīy Bay Technology, layout file formats conversion tool The softwares and tools listed below (in order of preference) can export valid and standardized GDS format files for the HIMT laser writing equipment. General information about the DXF format are available here. With many limitations and restrictions, DXF files may be accepted and converted correctly by the HIMT conversion tool. The DXF file format as been developped by Autodesk to enable data exchange between AutoCAD and related softwares. General information about the CIF format are available here. In general, the CIF format is converted without issues but some proprietary text statements introduced in specific layout editors (such a Clewin) may not be interpretated correctly by the HIMT conversion tool. The CIF file format is a concise and human readable text based description of the layout. cif, CIF (Caltech Intermediate Format).General information about the GDS format are available here. The GDS file format is an industry standard and the recommended file format to flawlessly convert your design to the internal language of the HIMT direct laser writing equipment. gds, gdsii, gds2, GDSII (Graphic Database System for Information Interchange).While you can use your preferred CAD software to generate the layout, the design should be exported to formats that are compatible with the Heidelberg Instruments (HIMT) laser writing equipments used in CMi, such as (in order of recommendation): Some are proprietary, some public, some standard. There exist many layout file formats to describe such layouts. To create a complete 2D layout, the patterns can be drawn using dedicated computer-assisted design (CAD) softwares, generated using mathematics softwares such as Matlab or Octave, or coded using python/ruby programmed scripts. This will be a required step for either the fabrication of a Cr blank mask (to use on a mask-aligner or a stepper), or for exposing the photoresist with a UV laser (direct laser writing). to distinguish the areas where UV light will expose the photoresist from the areas where it will not. When you want to create a pattern on a wafer with photolithography, you have to describe or digitize the pattern by geometric shapes, i.e.
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